Synthesis and characterization of HfO2 and ZrO2 thin films deposited by plasma assisted reactive pulsed laser deposition at low temperature-Reference-Cited by-同舟云学术

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Synthesis and characterization of HfO2 and ZrO2 thin films deposited by plasma assisted reactive pulsed laser deposition at low temperature

Published:2010-07 Issue:19 Volume:518 Page:5442-5446
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Tang W.T.,Ying Z.F.,Hu Z.G.,Li W.W.,Sun J.,Xu N.,Wu J.D.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference34 articles.

1. Thin Films for Optical Systems;Kozlowski,1996

2. Output coupler design of unstable cavities for excimer lasers

3. Optical and durability properties of infrared transmitting thin films

4. Optical properties of hafnium oxide thin films and their application in energy-efficient windows

5. Vacuum ultraviolet thin films 1: Optical constants of BaF_2, CaF_2, LaF_3, MgF_2, Al_2O_3, HfO_2, and SiO_2 thin films

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