Efficient source mask optimization with Zernike polynomial functions for source representation-Reference-Cited by-同舟云学术

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Efficient source mask optimization with Zernike polynomial functions for source representation

Published:2014-02-12 Issue:4 Volume:22 Page:3924
ISSN:1094-4087
Container-title:Optics Express
language:en
Short-container-title:Opt. Express

Author:

Wu Xiaofei,Liu Shiyuan,Li Jia,Lam Edmund Y.

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference27 articles.

1. Intensive optimization of masks and sources for 22nm lithography

2. Performance of FlexRay: a fully programmable illumination system for generation of freeform sources on high NA immersion systems

3. Applicability of global source mask optimization to 22/20nm node and beyond

4. Pixelated source mask optimization for process robustness in optical lithography

5. Improved mask and source representations for automatic optimization of lithographic process conditions using a genetic algorithm

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