Intensive optimization of masks and sources for 22nm lithography-Reference-Cited by-同舟云学术

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Intensive optimization of masks and sources for 22nm lithography

Published:2009-03-13 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Rosenbluth Alan E.,Melville David O.,Tian Kehan,Bagheri Saeed,Tirapu-Azpiroz Jaione,Lai Kafai,Waechter Andreas,Inoue Tadanobu,Ladanyi Laszlo,Barahona Francisco,Scheinberg Katya,Sakamoto Masaharu,Muta Hidemasa,Gallagher Emily,Faure Tom,Hibbs Michael,Tritchkov Alexander,Granik Yuri

Publisher

SPIE

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Critical Pattern Selection Method Based on CNN Embeddings for Full-Chip Optimization;Photonics;2023-10-25

2. Source mask optimization for extreme-ultraviolet lithography based on thick mask model and social learning particle swarm optimization algorithm;Optics Express;2021-02-04

3. Source mask optimization using the covariance matrix adaptation evolution strategy;Optics Express;2020-10-21

4. Probability prediction model for bridging defects induced by combined influences from lithography and etch variations;Journal of Micro/Nanolithography, MEMS, and MOEMS;2019-05-30

5. Enhanced OPC recipe coverage and early hotspot detection through automated layout generation and analysis;SPIE Proceedings;2017-03-17

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