Author:
Mulder Melchior,Engelen André,Noordman Oscar,Streutker Gert,van Drieenhuizen Bert,van Nuenen Cas,Endendijk Wilfred,Verbeeck Jef,Bouman Wim,Bouma Anita,Kazinczi Robert,Socha Robert,Jürgens Dirk,Zimmermann Joerg,Trauter Bastian,Bekaert Joost,Laenens Bart,Corliss Daniel,McIntyre Greg
Cited by
46 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Performance measurement of FlexRay pupil shaping module in lithography system;AOPC 2023: Optical Sensing, Imaging, and Display Technology and Applications; and Biomedical Optics;2023-12-18
2. High-NA EUV lithography: current status and outlook for the future;Japanese Journal of Applied Physics;2022-04-20
3. 步进扫描投影光刻机照明系统技术研究进展;Laser & Optoelectronics Progress;2022
4. 计算光刻研究及进展;Laser & Optoelectronics Progress;2022
5. Partially coherent beam smoothing using a microlens array;Optics Express;2021-12-16