Radiation thermometry of silicon wafers based on emissivity-invariant condition-Reference-Cited by-同舟云学术

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Radiation thermometry of silicon wafers based on emissivity-invariant condition

Published:2011-01-14 Issue:3 Volume:50 Page:323
ISSN:0003-6935
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Iuchi Tohru,Seo Tomohiro

Publisher

The Optical Society

Reference9 articles.

1. Rapid thermal processing systems: A review with emphasis on temperature control

2. Recent developments in rapid thermal processing

3. A Summary of Lightpipe Radiation Thermometry Research at NIST

4. In situemissivity measurements to probe the phase transformations during rapid thermal processing Co silicidation

5. Spectral Emissivity of Silicon

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