Recent developments in rapid thermal processing

Author:

Fiory A. T.

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference39 articles.

1. B. Mattson, P. Timans, S.-P. Tay, D.J. Devine, and J. Kim, “The Future of RTP, a Technology That Can Change the IC FAB Industry,” 9th Int. Conf. on Advanced Thermal Processing of Semiconductors—RTP 2001, ed. D.P. DeWitt, J. Gelpey, B. Lojek, and Z. Nenyei (Piscataway, NJ: IEEE, 2001), pp. 13–17.

2. International Technology Roadmap for Semiconductors (San Jose, CA: Semiconductor Industry Association, 2001), http://public.itrs.net.

3. M. Ameen and J. Hebb, Solid State Technol. 44, 77 (2001).

4. H. Park et al., Very Large Scale Integration Symp. Technical Digest 0-7803-7312-X/02 (Piscataway, NJ: IEEE, 2002).

5. K. Mori, A. Duong, and W.F. Richardson, IEEE Trans. Electron. Dev. 49, 61 (2002).

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