Calibration method of overlay measurement error caused by asymmetric mark-Reference-Cited by-同舟云学术

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Calibration method of overlay measurement error caused by asymmetric mark

Published:2018-11-19 Issue:33 Volume:57 Page:9814
ISSN:1559-128X
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Du Juyou,Dai Fengzhao,Bu Yang,Wang Xiangzhao

Funder

National Natural Science Foundation of China (NSFC)

National Science and Technology Major Project of China

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering

Reference16 articles.

1. NXT:1980Di immersion scanner for 7nm and 5nm production nodes

2. Weighted least squares regression for advanced overlay control

3. Improving scanner wafer alignment performance by target optimization

4. Rigorous wafer topography simulation for investigating wafer alignment quality and robustness

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2. 光刻对准关键技术的发展与挑战;Acta Optica Sinica;2023

3. Improving the cross-layer misalignment measurement accuracy by pattern-center shift induced error calibration;Optics and Lasers in Engineering;2022-08

4. Optimized wavelength selection for diffraction-based overlay measurement by minimum asymmetry factor variation with finite-difference time-domain simulation;Applied Optics;2022-02-11

5. 相位光栅非对称性对位置测量精度的影响;Acta Optica Sinica;2021

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