A maximum likelihood approach to the inverse problem of scatterometry
Author:
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference25 articles.
1. Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ, real-time process monitoring
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4. On numerical reconstructions of lithographic masks in DUV scatterometry
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