Diffraction-based overlay metrology using angular-multiplexed acquisition of dark-field digital holograms
Author:
Funder
ASML
Advanced Research Center for Nanolithography
Vrije Universiteit Amsterdam
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference37 articles.
1. Cramming more components onto integrated circuits, Reprinted from Electronics, volume 38, number 8, April 19, 1965, pp.114 ff.
2. Metrology for the next generation of semiconductor devices
3. Holistic approach for overlay and edge placement error to meet the 5nm technology node requirements;MulkensUkraintsev,2018
4. Optimized Overlay Metrology Marks: Theory and Experiment
Cited by 20 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. A review on optical characterization of refractive index in photonic related devices and applications;Journal of Physics D: Applied Physics;2024-09-10
2. X-ray-based overlay metrology using reciprocal space slicing analysis;Optics Letters;2023-12-05
3. Robust semiconductor overlay metrology with non-uniform illumination beams using digital holographic microscopy;Optical Measurement Systems for Industrial Inspection XIII;2023-08-15
4. Multi-spectral snapshot diffraction-based overlay metrology;Optics Letters;2023-06-16
5. Illumination spot profile correction in digital holographic microscopy for overlay metrology;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-06-05
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3