Hydrostatic stress and hydrostatic stress gradients in passivated copper interconnects
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference34 articles.
1. Proceedings of the First International Workshop;Totta,1991
2. Stress analysis of encapsulated fine‐line aluminum interconnect
3. Stress in metal lines under passivation; comparison of experiment with finite element calculations
4. Thermal stresses in aluminum lines bounded to substrates
5. Proceedings of the Third International Workshop;Burges,1995
Cited by 11 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Incorporating Process Variations Into SRAM Electromigration Reliability Assessment Using Atomic Flux Divergence;IEEE Transactions on Very Large Scale Integration (VLSI) Systems;2015
2. Thermally induced void growth in through-silicon vias;Journal of Micro/Nanolithography, MEMS, and MOEMS;2013-06-05
3. Finite element analysis of thermal stress for different Cu interconnects structure;Microelectronics Reliability;2012-11
4. Measuring thermally induced void growth in conformally filled through-silicon vias (TSVs) by laboratory x-ray microscopy;SPIE Proceedings;2012-03-29
5. Applying x-ray microscopy and finite element modeling to identify the mechanism of stress-assisted void growth in through-silicon vias;Journal of Applied Physics;2011-09
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3