High resolution variable-shaped beam direct write-Reference-Cited by-同舟云学术

High resolution variable-shaped beam direct write

Published:2007-05 Issue:5-8 Volume:84 Page:774-778
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Hahmann Peter,Bettin Lutz,Boettcher Monika,Denker Ulrich,Elster Thomas,Jahr Steffen,Kirschstein Ulf-Carsten,Kliem Karl-Heinz,Schnabel Bernd

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference13 articles.

1. Shaped e-beam lithography integration work for advanced ASIC manufacturing: progress report

2. Advanced patterning studies using shaped e-beam lithography for 65-nm CMOS preproduction

3. Looking into the crystal ball: future device learning using hybrid e-beam and optical lithography (Keynote Paper)

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