Advanced patterning studies using shaped e-beam lithography for 65-nm CMOS preproduction-Reference-Cited by-同舟云学术

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Advanced patterning studies using shaped e-beam lithography for 65-nm CMOS preproduction

Published:2003-06-13 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Pain Laurent,Charpin Murielle,Laplanche Yves,Herisson David,Todeschini J.,Palla Ramiro,Beverina A.,Leininger H.,Tourniol S.,Broekaart M.,Luce Emmanuelle,Judong F.,Brosselin K.,Le Friec Y.,Leverd F.,Del Medico S.,De Jonghe V.,Henry Daniel,Woo M. P.,Arnaud F.

Publisher

SPIE

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Numerical Investigations of a Silicon Photonic TE-Pass Polarizer Consisting of Alternating Copper/Silicon Nitride Layers;IEEE Photonics Journal;2017-04

2. Practical study on the electron-beam-only alignment strategy for the electron beam direct writing technology;Alternative Lithographic Technologies V;2013-03-26

3. 50 years of electron beam lithography: Contributions from Jena (Germany);Microelectronic Engineering;2009-04

4. Coulomb blur advantage of a multi-shaped beam lithography approach;Alternative Lithographic Technologies;2009-03-13

5. Cell projection use in maskless lithography for 45nm and 32nm logic nodes;Alternative Lithographic Technologies;2009-03-13

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