Looking into the crystal ball: future device learning using hybrid e-beam and optical lithography (Keynote Paper)-Reference-Cited by-同舟云学术

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Looking into the crystal ball: future device learning using hybrid e-beam and optical lithography (Keynote Paper)

Published:2005-05-06 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Steen S. E.,McNab S. J.,Sekaric L.,Babich I.,Patel J.,Bucchignano J.,Rooks M.,Fried D. M.,Topol A. W.,Brancaccio J. R.,Yu R.,Hergenrother J. M.,Doyle J. P.,Nunes R.,Viswanathan R. G.,Purushothaman S.,Rothwell M. B.

Publisher

SPIE

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Two-Stage Layout Decomposition for Hybrid E-Beam and Triple Patterning Lithography;ACM Transactions on Design Automation of Electronic Systems;2017-10-17

2. High-resolution, high-throughput, CMOS-compatible electron-beam patterning;SPIE Proceedings;2017-03-27

3. Mask registration and lithography platform portability for nitride fin-based field effect transistors prototyping;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2016-11

4. Practical study on the electron-beam-only alignment strategy for the electron beam direct writing technology;Alternative Lithographic Technologies V;2013-03-26

5. Charged-Particle Lithography;Nanotechnology;2010-07-15

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