Author:
Jo Minseok,Park Hokyung,Chang Man,Jung Hyung-Suk,Lee Jong-Ho,Hwang Hyunsang
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
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4. Effects of ALD HfO2 thickness on charge trapping and mobility
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