Author:
Bracht H.,Schneider S.,Kube R.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference48 articles.
1. C. Claeys, E. Simoen (Eds.), Germanium-Based Technologies – From Materials to Devices, Elsevier, Amsterdam, 2007.
2. Germanium MOSFET Devices: Advances in Materials Understanding, Process Development, and Electrical Performance
3. N.A. Stolwijk, H. Bracht, Diffusion in Silicon, Germanium and their Alloys, Landolt-Börnstein New Series, vol. III/33, Subvolume A, Springer, New York, 1998.
4. Self- and foreign-atom diffusion in semiconductor isotope heterostructures. II. Experimental results for silicon
5. Effect of hydrostatic pressure, temperature, and doping on self-diffusion in germanium
Cited by
33 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献