Author:
Zhao Larry,Volders Henny,Baklanov Mikhail,Tőkei Zsolt,Pantouvaki Marianna,Wilson Christopher J.,Van Besien Els,Beyer Gerald P.,Claeys Cor
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference19 articles.
1. Low dielectric constant materials for microelectronics
2. Effect of plasma interactions with low-κ films as a function of porosity, plasma chemistry, and temperature
3. M.R. Baklanov, A. Urbanowicz, G. Mannaert, S. Vanhaelemeersch, in: Proceedings of the Eighth International Conference on Solid-State and Integrated Circuit Technology Part 1, Shanghai, China, October 23–26, 2006, pp. 291–294.
4. Mechanisms of porous dielectric film modification induced by reducing and oxidizing ash plasmas
5. Mechanistic study of plasma damage of low k dielectric surfaces
Cited by
19 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献