Fabrication of Bulk-Si FinFET using CMOS compatible process-Reference-Cited by-同舟云学术

Fabrication of Bulk-Si FinFET using CMOS compatible process

Published:2012-06 Issue: Volume:94 Page:26-28
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Zhou Huajie,Song Yi,Xu Qiuxia,Li Yongliang,Yin Huaxiang

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference10 articles.

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3. N. Collaert, M. Aoulaiche, B. De Wachter, M. Rakowski, A. Redolfi, S. Brus, A. De Keersgieter, N. Horiguchi, L. Altimime. M. Jurczak, in: Symposium on VLSI Technology Digest of Technical Papers, 2010, p. 161.

4. A. Redolfi, E. Sleeckx, K. Devriendt, D. Shamiryan, T. Vandeweyer, N. Horiguchi, M. Togo, J.M.D. Wouter, M. Jurczak, T. Hoffmann, A. Cockburn, V. Gravey, D.L. Diehl, Ultimate Integration on Silicon (ULIS), 2011 12th International Conference on 2011, p. 1.

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