Experimental test chamber design for optics exposure testing and debris characterization of a xenon discharge produced plasma source for extreme ultraviolet lithography-Reference-Cited by-同舟云学术

Experimental test chamber design for optics exposure testing and debris characterization of a xenon discharge produced plasma source for extreme ultraviolet lithography

Published:2006-03 Issue:3 Volume:83 Page:476-484
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Thompson Keith C.,Antonsen Erik L.,Hendricks Matthew R.,Jurczyk Brian E.,Williams M.,Ruzic D.N.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference18 articles.

1. High-resolution templates for step and flash imprint lithography

2. EUV source power and lifetime: the most critical issues for EUV lithography

3. XTREME Technologies GmbH, www.xtremetec.de, Gottingen, Germany.

4. I.V. Fomenkov, W.N. Partlo, N.R. Böwering, A.I. Ershov, C.L. Rettig, R.M. Ness, I.R. Oliver, S.T. Melnychuk, O.V. Khodykin, J.R. Hoffman, V.B. Fleurov, J.M. Algots, J.W. Viatella, B.A.M. Hansson, O. Hemberg, A.N. Bykanov, E.A. Lopez, P.C. Oh, T.D. Steiger, D.W. Myers, Progress in Development of a High Power EUV Source for EUV Lithography, 2004. Available from: .

5. J. Pankert, Philips’s EUV Source: Main Messages, 2004. Available from: .

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