Magnetic debris mitigation system for extreme ultraviolet sources-Reference-Cited by-同舟云学术

Magnetic debris mitigation system for extreme ultraviolet sources

Published:2015-02-09 Issue:1 Volume:14 Page:013506
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Elg Daniel T.¹,Sporre John R.¹,Curreli Davide¹,Shchelkanov Ivan A.¹,Ruzic David N.¹,Umstadter Karl R.²

Affiliation:

1. University of Illinois at Urbana-Champaign, Center for Plasma-Material Interactions, Department of Nuclear, Plasma, and Radiological Engineering, 216 Talbot Laboratory MC-234, 104 South Wright Street, Urbana, Illinois 61801, United States

2. KLA-Tencor Corporation, 1 Technology Drive, Milpitas, California 95035, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

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2. Reliability studies of a 22-nm SoC platform technology featuring 3-D tri-gate, optimized for ultra low power, high performance and high density application;Rahman,2013

3. Effect of Electron Density on Extreme Ultraviolet Output of a Z-Pinch Xe Discharge Produced Plasma Source

4. Laser wavelength effects on the charge state resolved ion energy distributions from laser-produced Sn plasma

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