High-resolution templates for step and flash imprint lithography-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

High-resolution templates for step and flash imprint lithography

Published:2002-07-05 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Emerging Lithographic Technologies VI
language:
Short-container-title:

Author:

Resnick Douglas J.,Dauksher William J.,Mancini David P.,Nordquist Kevin J.,Ainley Eric S.,Gehoski Kathleen A.,Baker Jeff H.,Bailey Todd C.,Choi Byung J.,Johnson Stephen C.,Sreenivasan S. V.,Ekerdt John G.,Willson C. Grant

Publisher

SPIE

Cited by 66 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Improvement of productivity by spin-coating and flash imprint lithography;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-03-04

2. Nanomechanical properties of the ZEP-520 electron beam resist film;Materials Today Communications;2021-06

3. Fluid flow in UV nanoimprint lithography with patterned templates;Microelectronic Engineering;2017-04

4. Effect of droplet size, droplet placement, and gas dissolution on throughput and defect rate in UV nanoimprint lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2017-01

5. Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors;IEEE Transactions on Nanotechnology;2016-05

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP