Author:
Li Yan-Lin,Chang-Liao Kuei-Shu,Li Chen-Chien,Chen Li-Ting,Su Tzu-Hsiang,Chang Yu-Wei,Chen Ting-Chun,Tsai Chia-Chi,Kao Chia-Hung,Feng Hao-Ting,Lee Yao-Jen
Funder
Ministry of Science and Technology
NDL
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference9 articles.
1. Chemical Oxide Interfacial Layer for the High-$k$-Last/Gate-Last Integration Scheme
2. E. Dentoni Litta, P.E. Hellstrom, C. Henkel, M. Ostling, ULIS, 2013, pp. 121–124.
Cited by
3 articles.
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