Author:
Quinteros Cynthia P.,Hardtdegen Alex,Barella Mariano,Golmar Federico,Palumbo Félix,Curiale Javier,Hoffmann-Eifert Susanne,Levy Pablo
Reference28 articles.
1. George SM. Atomic Layer Deposition: An Overview. Chemical Reviews. 2010;110(1):111-131
2. Franssila S. Introduction to Microfabrication. Chichester, England: Wiley; 2004. p. 331
3. Ohring M. Materials Science of Thin Films. Chapter 6, 2nd ed. Amsterdam, The Netherlands: Elsevier; 1991
4. Choi JH, Mao Y, Chang JP. Development of hafnium based high-k materials—A review. Materials Science & Engineering R: Reports. 2011 Jul 22;72(6):97-136
5. Li Y-L, Chang-Liao K-S, Li C-C, Chen L-T, Su T-H, Chang Y-W, et al. Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer. Microelectronic Engineering. 2015 Nov 1;147:67-71
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