Achieving excellent ferroelectric and dielectric performance of HfO2/ZrO2/HfO2 thin films under low operating voltage
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Mechanical Engineering,Mechanics of Materials
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1. Superior electrical properties and ferroelectric stability of Hf0.85Ce0.15O2-ZrO2 stacks on Si and flexible mica substrates;Journal of the European Ceramic Society;2025-02
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3. Magnetically-induced enhancement of photocatalytic dye decomposition in ferroelectric Hf0.5Zr0.5O2 films;Ceramics International;2024-09
4. Distinguishing the Rhombohedral Phase from Orthorhombic Phases in Epitaxial Doped HfO2 Ferroelectric Films;ACS Applied Materials & Interfaces;2024-08-05
5. Large ferroelectric polarization and high dielectric constant in HfO2-based thin films via Hf0.5Zr0.5O2/ZrO2 nanobilayer engineering;Journal of Materiomics;2024-08
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