Author:
Katoh Takanori,Nishi Nobuyoshi,Fukagawa Masafumi,Ueno Hiroshi,Sugiyama Susumu
Subject
Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials
Reference12 articles.
1. One-level gray-tone design-mask data preparation and pattern transfer;Reimer;Microelectron. Eng.,1996
2. S. Nicolas, Experimental study of gray-tone UV lithography of thick photoresist, Proc. Eurosensors XI (1997) 1271–1274.
3. Multi-level 3-D patterning of stacked PMMA sheets for X-ray microlithography;Calderon;Proc. SPIE Conf.,1996
4. Moving mask LIGA (M2LIGA) process for control of side wall inclination;Tabata;Proc. MEMS,1999
5. X-ray lathe: an X-ray lithographic exposure tool for nonplanar objects;Feinerman;J. Microelectromech. Syst.,1996
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