Grayscale lithography—automated mask generation for complex three-dimensional topography-Reference-Cited by-同舟云学术

Grayscale lithography—automated mask generation for complex three-dimensional topography

Published:2016-03-23 Issue:1 Volume:15 Page:013511
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Loomis James¹,Ratnayake Dilan²,McKenna Curtis²,Walsh Kevin M.²

Affiliation:

1. University of Auckland, Department of Mechanical Engineering, 20 Symonds Street, Auckland 1010, New Zealand

2. University of Louisville, Department of Electrical and Computer Engineering, W.S. Speed Hall 200, Louisville, Kentucky 40292, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

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