40 keV shaped electron beam lithography for LIGA intermediate mask fabrication

Author:

Lüttge R.,Adam D.,Burkhardt F.,Hoke F.,Schacke H.,Schmidt M.,Wolf H.,Schmidt A.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference7 articles.

1. X-ray lithography for ≤100 nm ground rules in complex patterns

2. R. Lüttge et al, Micro System Technologies '98, to be published

3. Low-temperature silicon wafer bonding

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1. Fabrication of high energy X-ray compound kinoform lenses using X-ray lithography;Microsystem Technologies;2017-02-01

2. Proton beam writing and electroplating for the fabrication of high aspect ratio Au microstructures;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2009-07

3. The fabrication of x-ray masks using proton beam writing;Journal of Micromechanics and Microengineering;2008-07-04

4. Mask technologies for deep x-ray LIGA;19th European Conference on Mask Technology for Integrated Circuits and Microcomponents;2003-06-02

5. Plastic micro-optical components with the LIGA technology;Micromachining Technology for Micro-Optics and Nano-Optics;2003-01-25

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