Author:
Yue Weisheng,Chiam Sher-Yi,Ren Yaping,van Kan Jeroen Anton,Osipowicz Thomas,Jian Linke,Moser Herbert O,Watt Frank
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,Electronic, Optical and Magnetic Materials
Cited by
9 articles.
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1. Design considerations for a compact proton beam writing system aiming for fast sub-10 nm direct write lithography;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2017-08
2. Quadrupole lens alignment with improved STIM and secondary electron imaging for Proton Beam Writing;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2017-08
3. Automatic beam focusing in the 2nd generation PBW line at sub-10nm line resolution;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2015-04
4. A simple approach for an ultra-precise patterning using deep x-ray lithography with a micron-patterned x-ray mask;International Journal of Precision Engineering and Manufacturing;2014-11
5. Application of stencil masks for ion beam lithographic patterning;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2013-07