In-situ monitoring of electron beam induced deposition by atomic force microscopy in a scanning electron microscope-Reference-Cited by-同舟云学术

In-situ monitoring of electron beam induced deposition by atomic force microscopy in a scanning electron microscope

Published:2003-06 Issue: Volume:67-68 Page:963-969
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Bauerdick S.,Burkhardt C.,Rudorf R.,Barth W.,Bucher V.,Nisch W.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference5 articles.

1. High-resolution electron-beam induced deposition

2. Electron beam induced surface nucleation and low-temperature decomposition of metal carbonyls

3. T. Liang, A. Stivers, Proceedings of SPIE’s 27th Annual International Symposium on Microlithography, SPIE International Society for Optical Engineering, Santa Clara, CA, 2002.

4. C. Burkhardt, S. Bauerdick, R. Rudorf, W. Nisch, V. Bucher, W. Barth, A. Ehrmann, T. Lutz, J. Rau, extended abstract in Book of Abstracts Micro- and Nanoengineering International Conference, Lugano, Switzerland, 2002.

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