A review of the mechanical stressors efficiency applied to the ultra-thin body & buried oxide fully depleted silicon on insulator technology-Reference-Cited by-同舟云学术

A review of the mechanical stressors efficiency applied to the ultra-thin body & buried oxide fully depleted silicon on insulator technology

Published:2016-03 Issue: Volume:117 Page:100-116
ISSN:0038-1101
Container-title:Solid-State Electronics
language:en
Short-container-title:Solid-State Electronics

Author:

Morin Pierre,Maitrejean Sylvain,Allibert Frederic,Augendre Emmanuel,Liu Qing,Loubet Nicolas,Grenouillet Laurent,Pofelski Alexandre,Chen Kangguo,Khakifirooz Ali,Wacquez Romain,Reboh Shay,Bonnevialle Aurore,le Royer Cyrille,Morand Yves,Kanyandekwe Joel,Chanemougamme Daniel,Mignot Yann,Escarabajal Yann,Lherron Benoit,Chafik Fadoua,Pilorget Sonia,Caubet Pierre,Vinet Maud,Clement Laurent,Desalvo Barbara,Doris Bruce,Kleemeier Walter

Publisher

Elsevier BV

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference107 articles.

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