Large-signal modelling including low-frequency dispersion of n-channel SiGe MODFETs and MMIC applications

Author:

Kallfass Ingmar,Brazil Thomas J.,OhAnnaidh Breandan,Abele Peter,Hackbarth Thomas,Zeuner Marco,König Ulf,Schumacher Hermann

Publisher

Elsevier BV

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference16 articles.

1. Sub 100 nm gate technologies for Si/SiGe buried channel RF devices;Zeuner;Jpn. J. Appl. Phys.,2003

2. DC and high-frequency performance of a 0.1 μm n-type Si/Si0.6Ge0.4 MODFET with fmax=188 GHz at 300 K and fmax=230 GHz at 50 K;Enciso-Aguilar;Electron. Lett.,2003

3. Giguerre L, Aniel F, Enciso M, Herzog H-J, König U, Adde R. Physical modelling of short gatelength Si/SiGe n-MODFET. Proc GaAs Symposium, London 24th–25th September 2001. p. 139–42

4. Enciso M, Aniel F, Giguerre L, Crozat P, Adde R, Zeuner M, et al. High frequency properties of Si/SiGe n-MODFETs: dependence on gate length and temperature. Proc GAAS Symposium, London 24th–25th September 2001. p. 187–90

5. Zeuner M, König U. SiGe HFET technology. GaAs Symposium, London 24th–25th September 2001. WS Advanced Silicon Technology

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1. Nonlinear modeling of GaAs pHEMTs for millimeter-wave mixer design;Solid-State Electronics;2015-02

2. SiGe MMICs;Circuits and Applications Using Silicon Heterostructure Devices;2007-12-13

3. Multiple time constant modeling of dispersion dynamics in hetero field-effect transistors;IEEE Transactions on Microwave Theory and Techniques;2006-06

4. SiGe MMICs;Silicon Heterostructure Handbook;2005-11

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