Gate dielectric engineering of quarter sub micron AlGaN/GaN MISHFET: A new device architecture for improved transconductance and high cut-off frequency

Author:

Aggarwal Ruchika,Agrawal Anju,Gupta Mridula,Gupta R.S.

Publisher

Elsevier BV

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference18 articles.

1. The special issue on group III-N semiconductor electronics;Mishra;IEEE Trans Electron Dev,2001

2. Fabrication and performance of GaN electronic devices;Pearton;Mater Sci Eng Rev,2000

3. Leakage mechanism in GaN and AlGaN Schottky interfaces;Hashizume;Appl Phys Lett,2004

4. Si3N4/AlGaN/GaN-metal–insulator–semiconductor heterostructure field-effect transistors;Hu;Appl Phys Lett,2001

5. Microwave performance of AlGaN/GaN metal insulator semiconductor field effect transistors on sapphire substrates;Chumbes;IEEE Trans Electron Dev,2001

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