An unified analytical model for design consideration of doped cubic and undoped hexagonal AlGaN/GaN MIS gate HEMTs

Author:

Ghosh Saptarsi,Bag Ankush,Jana Sanjay K.,Mukhopadhyay Partha,Dinara Syed Mukulika,Kabi Sanjib,Biswas Dhrubes

Publisher

Elsevier BV

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference32 articles.

1. 1200-V Normally off Gan-on-Si field-effect transistors with low dynamic on-resistance;Chu;IEEE Electron Device Lett,2011

2. AlGaN/GaN MIS-HFETs with fT of 163GHz using Cat-CVD SiN gate-insulating and passivation layers;Higashiwaki;IEEE Electron Device Lett,2006

3. High fmax with high breakdown voltage in AlGaN/GaN MIS-HFETs using in situ SiN as gate insulators;Kuroda;Proc CSIC’08,2008

4. AlN/GaN insulated-gate HEMTs with 2.3A/mm output current and 480mS/mm transconductance;Zimmermann;IEEE Electron Device Lett,2008

5. Design of high-aspect-ratio T-gates on N-polar GaN/AlGaN MIS-HEMTs for high fmax;Denninghoff;IEEE Electron Device Lett,2012

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