Implementation of E-Beam Proximity Effect Correction using linear programming techniques for the fabrication of asymmetric bow-tie antennas

Author:

Yesilkoy Filiz,Choi Kwangsik,Dagenais Mario,Peckerar Martin

Publisher

Elsevier BV

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference14 articles.

1. Choi K, Dagenais M, Peckerar MM. Fabrication of a thin film asymmetric tunneling diode using geometric field enhancement. In: Semiconductor device research symposium, 2009. ISDRS ’09. International, 9–11 December 2009. p. 1–2.

2. Proximity effect in electron-beam lithography;Chang;J Vac Sci Technol,1975

3. Proximity effect correction calculations by the integral equation approximate solution method;Pavkovich;J Vac Sci Technol B: Microelectron Nanometer Struct,1986

4. Calculation of changes in pattern dimensions to compensate for proximity effects in electron lithography;Parikh;J Appl Phys,1980

5. Eisenmann H, Waas T, Hartmann H. Proxecco—proximity effect correction by convolution. In: Proceedings of the 16th international symposium on electron, ion, and photon beams, vol. 11(6); 1993. p. 2741–5.

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