Author:
Yesilkoy Filiz,Choi Kwangsik,Dagenais Mario,Peckerar Martin
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference14 articles.
1. Choi K, Dagenais M, Peckerar MM. Fabrication of a thin film asymmetric tunneling diode using geometric field enhancement. In: Semiconductor device research symposium, 2009. ISDRS ’09. International, 9–11 December 2009. p. 1–2.
2. Proximity effect in electron-beam lithography;Chang;J Vac Sci Technol,1975
3. Proximity effect correction calculations by the integral equation approximate solution method;Pavkovich;J Vac Sci Technol B: Microelectron Nanometer Struct,1986
4. Calculation of changes in pattern dimensions to compensate for proximity effects in electron lithography;Parikh;J Appl Phys,1980
5. Eisenmann H, Waas T, Hartmann H. Proxecco—proximity effect correction by convolution. In: Proceedings of the 16th international symposium on electron, ion, and photon beams, vol. 11(6); 1993. p. 2741–5.
Cited by
13 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献