Proximity effect in electron‐beam lithography-Reference-Cited by-同舟云学术

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Proximity effect in electron‐beam lithography

Published:1975-11 Issue:6 Volume:12 Page:1271-1275
ISSN:0022-5355
Container-title:Journal of Vacuum Science and Technology
language:en
Short-container-title:Journal of Vacuum Science and Technology

Author:

Chang T. H. P.

Publisher

American Vacuum Society

Subject

General Engineering

Link

http://avs.scitation.org/doi/pdf/10.1116/1.568515

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