Micromachined Faraday cup array using deep reactive ion etching-Reference-Cited by-同舟云学术

Micromachined Faraday cup array using deep reactive ion etching

Published:2002-01 Issue:2-3 Volume:95 Page:84-93
ISSN:0924-4247
Container-title:Sensors and Actuators A: Physical
language:en
Short-container-title:Sensors and Actuators A: Physical

Author:

Darling Robert B,Scheidemann Adi A,Bhat K.N,Chen T.-C

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

Reference10 articles.

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4. Large diameter plasma profile monitoring using Faraday cup arrays;Morain;Meas. Sci. Tech.,1993

5. R.B. Liebert, Method and Apparatus for Ion Beam Centroid Location, US Patent No. 4,724,324, 9 February 1988.

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