Author:
Noda Shuichi,Ozawa Nobuo,Kinoshita Takashi,Tsuboi Hideo,Kawashima Kenji,Hikosaka Yukinobu,Kinoshita Keizo,Sekine Makoto
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference19 articles.
1. Etch rate control in a 27 MHz reactive ion etching system for ultralarge scale integrated circuit processing
2. Microscopic uniformity in plasma etching
3. Jpn. J. Appl. Phys;Ohiwa;Part 37,1998
4. Proceedings of 14th Dry Process Symposium (IEE of Japan, Tokyo, 1992);Sakai,1992
5. Abstract of 52nd Gaseous Electronics Conference (APS, Norfolk, VA, 1999) BT2-7;Noda,1999
Cited by
14 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献