Numerical investigation of the production mechanism of a low-temperature electron cyclotron resonance plasma
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference10 articles.
1. Tanaka T, Kato K, Iizuka S, Sato N. Proceedings of the Second Asia-Pacific Conference on Plasma Science and Technology, 1994. p. 337.
2. Plasma parameter measurements and deposition of a-Si:H thin films in pulsed ECR plasma.
3. Production of Low-Electron-Temperature Electron Cyclotron Resonance Plasma Using Nitrogen Gas in the Mirror Magnetic Field
4. One-Dimensional Simulation of Microwave Propagation in Electron Cyclotron Resonance Plasmas
5. McVey B, Scharer. J Phys Rev Lett 1973;31:14.
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