Effect of magnetic field profile on the uniformity of a distributed electron cyclotron resonance plasma
Author:
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4813788
Reference28 articles.
1. Scalable large volume ECR plasma generation for low pressure applications
2. Fabrication of ultrathin Ni–Zn ferrite films using electron cyclotron resonance sputtering method
3. TE/sub 01/ excitation of an electron cyclotron resonance plasma source
4. Production of multicharged ions in a 2.45 GHz electron cyclotron resonance source directly excited in a circular TE01 mode cavity resonator
5. Effect of applied magnetic field on a microwave plasma thruster
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1. Gyro-magnetically induced transparency and opaqueness at microwave frequency;Sensors and Actuators A: Physical;2022-09
2. Regulating the uniformity of DLC films in ECR plasma with negative substrate biasing;Surface and Coatings Technology;2019-05
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