In situ monitoring of plasma parameters in the afterglow region of ECR sputtering system for tribological coatings-Reference-Cited by-同舟云学术

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In situ monitoring of plasma parameters in the afterglow region of ECR sputtering system for tribological coatings

Published:2002-08 Issue:3-4 Volume:66 Page:197-202
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Lungu C.P,Iwasaki K

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference7 articles.

1. Ishikawa H, Nomura K, Mizuno Y, Michioka H, Fuwa Y, Yasuhara S. SAE Paper 960988.

2. Deposition and structural properties of two-component metal coatings for tribological applications

3. Huddlestone RH, Leonard SL. Plasma Diagnostic Techniques, New York: Academic Press, 1965. p. 204.

4. NIST Atomic Spectra Database, http://physics.nist.gov/PhysRefData/ASD1.

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1. Optical emission spectroscopy of the sputtering process in the triode system;Radiation Effects and Defects in Solids;2014-07-14

2. Characterisation of the plasma density with two artificial neural network models;Chinese Physics B;2010-07

3. Prediction of the plasma distribution using an artificial neural network;Chinese Physics B;2009-06

4. Characterization of spatial plasma distribution in a divergence-type ECR-PECVD system;Vacuum;2006-09

5. Spatial Distribution of ECR Plasma Density in ECR-PECVD Reaction Chamber;Plasma Science and Technology;2006-05

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