Characterization of spatial plasma distribution in a divergence-type ECR-PECVD system
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference13 articles.
1. Experimental electron energy distribution functions in argon, nitrogen and oxygen high-density and low-pressure reflex and microwave plasma sources
2. Influence of Deposition Temperature on the Structure of Si3N4Thin Film Prepared by MWECR-PECVD
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2. Properties of Cu2ZnSnS4 (CZTS) thin films prepared by plasma assisted co-evaporation;Journal of Materials Science: Materials in Electronics;2015-06-03
3. Effects of Al concentrations on the microstructure and mechanical properties of Ti–Al–N films deposited by RF-ICPIS enhanced magnetron sputtering;Journal of Alloys and Compounds;2014-10
4. Stress analyses of GaN film manufactured by ECR plasma-enhanced chemical vapor deposition;Vacuum;2012-04
5. New interpolation algorithm for evaluation a spatial profile of plasma densities in radio frequency discharges;Review of Scientific Instruments;2010-05
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