Deposition of thin films using microwave plasmas: present status and trends
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference38 articles.
1. Microwave plasma: its characteristics and applications in thin film technology
2. Electron cyclotron resonance microwave discharges for etching and thin‐film deposition
3. Proc 3rd Japanese Symposium on Plasma Chemistry;Musil,1990
4. Proc 8th Internat Conference on Plasma and Ion Assisted Techniques, IPAT-91;Musil,1991
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