1. Silicon Oxidation in an Oxygen Plasma Excited by Microwaves
2. Oxide Films Grown on GaAs in an Oxygen Plasma
3. Silicon Oxide Films Grown in a Microwave Discharge
4. Microwave Discharge Cavities Operating at 2450 MHz
5. G.Lisitano:Proceedings 7th International Conference Ionization Phenomena in Gases Gradevinska Knjiga Publishing House Beograd (1966) Vol.1 pp.464–467. G. Lisitano; “Radio‐frequency Plasma Generator” U.S. Patent 3 663 858 issued in 16 May 1972 priority 6 November 1970.