The use of monodispersed colloids in the polishing of copper and tantalum
Author:
Publisher
Elsevier BV
Subject
Colloid and Surface Chemistry,Surfaces, Coatings and Films,Biomaterials,Electronic, Optical and Magnetic Materials
Reference26 articles.
1. Silicon Processing for the VLSI Era, Vol. 2, Process Integration;Wolf,1990
2. Metallization;Murarka,1993
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