A robust and automated methodology for the analysis of Time-Dependent Variability at transistor level

Author:

Saraza-Canflanca P.,Diaz-Fortuny J.,Castro-Lopez R.,Roca E.,Martin-Martinez J.,Rodriguez R.,Nafria M.,Fernandez F.V.

Funder

AEI

FEDER

MINECO

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Hardware and Architecture,Software

Reference27 articles.

1. Emerging yield and reliability challenges in nanometer CMOS technologies;Gielen;Proceedings of Design, Automation and Test in Europe (DATE),2008

2. Impact of threshold voltage fluctuation due to random telegraph noise on scaled-down SRAM;Tega;Proceedings of International Reliability Physics Symposium (IRPS),2008

3. Origin of NBTI variability in deeply scaled pFETS;Kaczer;Proceedings of International Reliability Physics Symposium,2010

4. Hot carrier injection stress effect on a 65 nm LNA at 70 GHz;Yuan;IEEE Trans. Device Mater. Reliab.,2014

5. Degradation of time dependent variability due to interface state generation;Toledano-Luque,2013

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2. Determination of the Time Constant Distribution of a Defect-Centric Time-Dependent Variability Model for Sub-100-nm FETs;IEEE Transactions on Electron Devices;2022-10

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