Energy scaling and surface patterning of halogen-terminated Si(001) surfaces
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference16 articles.
1. A Surface View of Etching
2. Determination of Dynamic Parameters Controlling Atomic Scale Etching of Si(100)-( 2×1) by Chlorine
3. Vacancy-Assisted Halogen Reactions onSi(100)-(2×1)
4. Spontaneous Roughening: Fundamental Limits in Si(100) Halogen Etch Processing
5. Steric interaction model of roughening and vacancy reorganization on halogen-terminatedSi(100)−2×1surfaces
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2. Tuning patterning conditions by co-adsorption of gases: Br2 and H2 on Si(001);The Journal of Chemical Physics;2013-11-14
3. Energetics and Interactions of Mixed Halogen Adsorbates on the Si(100) Surface;The Journal of Physical Chemistry C;2011-06-17
4. Intense Laser Alignment As a Route to Control of Surface Reactions;The Journal of Physical Chemistry A;2010-05-13
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