Phase and structure transformations in the titanium interlayer during the nickel silicidation on Si(100) substrate
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference29 articles.
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2. Characterization of a Self‐Aligned Cobalt Silicide Process
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1. Precursors and chemistry for the atomic layer deposition of metallic first row transition metal films;Coordination Chemistry Reviews;2013-12
2. Influence of Ni silicide phases on effective work function modulation with Al-pileup in the Ni fully silicided gate/HfSiON system;Journal of Applied Physics;2009-08-15
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