Boron and indium substitution in GaAs(001) surfaces: Density-functional supercell calculations of the surface stability
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference45 articles.
1. Preparation and Properties of Boron Arsenides and Boron Arsenide-Gallium Arsenide Mixed Crystals
2. Molecular-beam epitaxial growth of boron-doped GaAs films
3. Molecular beam epitaxial growth of BGaAs ternary compounds
4. Metalorganic vapor phase epitaxy and characterization of boron‐doped (Al,Ga)As
5. MOVPE growth of BxGa1−xAs, BxGa1−x−yInyAs, and BxAl1−xAs alloys on (001) GaAs
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1. Boron-doped III–V semiconductors for Si-based optoelectronic devices;Journal of Semiconductors;2020-01-01
2. Growth of (BGa)As, (BGa)P, (BGa)(AsP) and (BGaIn)P by MOVPE;Journal of Crystal Growth;2013-05
3. Equilibrium compositional distribution in freestanding ternary semiconductor quantum dots: The case of InxGa1−xAs;The Journal of Chemical Physics;2011-12-21
4. Ab initioand scanning tunneling microscopy study of an indium-terminated GaAs(100) surface: An indium-induced surface reconstruction change in thec(8×2)structure;Physical Review B;2010-06-07
5. Boron and indium incorporation in GaP(001) surfaces by vapour deposition: Density-functional supercell calculations of the surface stability;Surface Science;2009-08
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