The use of ac power on cylindrical magnetrons
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference22 articles.
1. Compositional Control of Tantalum–Aluminum Alloy Films by a dc Biased, ac Sputtering Technique
2. A New AC Sputtering Technique for the Deposition of Thin Films
3. Development of Continuous Sputtering Machines
4. H. Kumagi, private communication.
5. Sputtering process and apparatus;Chapin,1979
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1. Progress on optical coatings deposited with dual rotatable magnetrons in a sputter up system;Surface and Coatings Technology;2014-02
2. Sputtering of dielectric single layers by metallic mode reactive sputtering and conventional reactive sputtering from cylindrical cathodes in a sputter-up configuration;Thin Solid Films;2013-04
3. Towards ultra-precise optical interference filters on large area: computational and experimental optimization of the homogeneity of magnetron-sputtered precision optical coatings;SPIE Proceedings;2012-09-13
4. Origin of particles during reactive sputtering of oxides using planar and cylindrical magnetrons;Applied Optics;2012-02-28
5. New sputtering concept for optical precision coatings;SPIE Proceedings;2011-09-22
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