Origin of particles during reactive sputtering of oxides using planar and cylindrical magnetrons-Reference-Cited by-同舟云学术

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Origin of particles during reactive sputtering of oxides using planar and cylindrical magnetrons

Published:2012-02-28 Issue:7 Volume:51 Page:927
ISSN:1559-128X
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Rademacher Daniel,Fritz Benjamin,Vergöhl Michael

Funder

German Federation of Industrial Research Associations

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering

Reference25 articles.

1. Cleaning of parts for precision-optic and glass substrates before coating;Strobel,2003

2. In situ analysis of particle contamination in magnetron sputtering process during magnetic media manufacturing;Sequeda,2001

3. Monitoring particles in sputter coaters;Borden,1991

4. Deposition of multilayer optical films and Rugate filters deposited by reactive magnetron sputtering;Vergöhl,2006

5. New developments in magnetron sputter processes for precision optics

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