Energy and dose dependence of ion beam mixing of Cu and W
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference16 articles.
1. Impurity profile broadening and shifts by ion beam mixing
2. Ion beam mixing in amorphous silicon II. Theoretical interpretation
3. Theoretical aspects of atomic mixing by ion beams
4. Recoil mixing in solids by energetic ion beams
5. The depth resolution of sputter profiling
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1. Perpendicularly magnetized ferromagnetism in Mn/Al bilayer thin films on Si substrates induced by temperature dependent ion beam mixing;Physica Scripta;2021-07-15
2. Athermal germanium migration in strained silicon layers during junction formation with solid-phase epitaxial regrowth;Applied Physics Letters;2005-02-21
3. Atomic transport in hot ion tracks;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2003-08
4. Atomic transport in thin film systems under heavy ion bombardment;Surface and Coatings Technology;2002-09
5. Low‐temperature mixing in Cu/W superlattices irradiated with light and heavy ions;Journal of Applied Physics;1993-03-15
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